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The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD

Title 
The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD
Authors 
Do Young Kim
Authors 
Hye Min Kang; Jae-Min Kim; Hyung Jun Kim
Keywords 
ZnO, ALD, Thermal, Plasma-enhanced, Thin film transistor
Issue Date 
2011
Publisher 
Elsevier
Journal 
Applied surface science
Vol. 
257
Issue 
8
Pages 
3776-3779
URI 
http://dx.doi.org/10.1016/j.apsusc.2010.11.138
http://repository.uc.ac.kr/handle/2014.oak/469
ISSN 
0169-4332
Appears in Collections
15. 전기전자공학부 > 연구논문

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