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Plasma-enhanced atomic layer deposition of Co using Co(MeCp)(2) precursor

Title 
Plasma-enhanced atomic layer deposition of Co using Co(MeCp)(2) precursor
Authors 
Do Young Kim
Authors 
Ju Sang Park; Han-Bo-Ram Lee; Jae Hong Yoon; Clement Lansalot; Julien Gatineau; Henri Chevrel; Hyung Jun Kim
Keywords 
PE-ALD, Th-ALD cobalt, metal thin films, metal organic precursors
Issue Date 
2013
Publisher 
Elsevier science
Journal 
Journal of energy chemistry
Vol. 
22
Issue 
3
Pages 
403-407
URI 
http://www.jenergchem.org/EN/Y2013/V22/I3/403
http://repository.uc.ac.kr/handle/2014.oak/496
ISSN 
2095-4956
Appears in Collections
15. 전기전자공학부 > 연구논문

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